公益社団法人 応用物理学会
半導体の結晶成長と加工および評価に関する産学連携委員会
Industry-academia collaboration committee on semiconductor crystal growth, processing and characterization, The Japan Society of Applied Physics (JSAP)
Welcome to 9th Si Symposium!
The 9th International Symposium on Advanced Science and Technology of Silicon and Related Materials
October 6-9, 2026
CHÂTERAISÉ HOTEL Nagano
Nagano, Japan
Important deadlines
Abstract Submission: May 31, 2026
Notification of Acceptance: July 1, 2026
Early Bird Registration: August 1, 2026
Special Issue Submission: October 31, 2026
NEWS
Site update information
April 5, 2026HomeFebruary 12, 2026SymposiumDecember 22, 2025Symposium他の投稿General Info
- Scope
- Topics
- Call for Papers
Program
- Invited Speakers
- Time Table
- Advanced Program
For Authors
- Abstract Submission
- Presentation Guidline
For Attendees
- Registration
- Optional Diner Party
- Excursion
For Sponsors (in Japanese)
- シンポジウム開催の趣旨
- 広告掲載の依頼
- 企業，大学研究室の展示
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Symposium Venue
CHÂTERAISÉ HOTEL Nagano (1-1 Nanase, Nagano, 380-0922, Japan)
https://nagano.chateraisehotel.jp (in Japanese)
Sponsors
The 9th International Symposium on Advanced Science and Technology of Silicon and Related Materials will be held under the auspices of Industry-academia collaboration committee on semiconductor crystal growth, processing and characterization in JSAP and received financial assistance from the following companies.
Committee
Organizing Committee
Chair: Toshinori Taishi (Shinshu University)
Vice-Chairs: Koji Sueoka (Okayama Prefectural University), Yasuhisa Sano (Osaka University), Yoshiki Tsukada (STR Japan)
Program Chair
Koji Sueoka (Okayama Prefectural University)
Publication Chair
Yasuhisa Sano (Osaka University)
Exhibition Chair
Yoshiki Tsukada (STR Japan)
Executive Advisory
Michio Tajima (JAXA), Koichi Kakimoto (Tohoku University), Atsushi Ogura (Meiji University), Akira Sakai (Osaka University)
Website Building
Masashi Kurosawa (Nagoya University)
©2023 Industry-academia collaboration committee on semiconductor crystal growth, processing and characterization, JSAP.